What is the process of doping and explain how it alters the atomic structure of silicon?

Doping is the process of intentionally introducing impurities into a semiconductor material, such as silicon, to modify its electrical properties. This is typically done by adding atoms from elements in Group III (like boron) or Group V (like phosphorus) of the Periodic Table. When a Group III element is added, it creates "holes" in the silicon's atomic structure, resulting in p-type semiconductors. Conversely, adding Group V elements introduces extra electrons, creating n-type semiconductors, thus altering the balance of charge carriers and enhancing the material's conductivity.