For lithography, essential equipment includes a mask aligner or stepper for projecting patterns onto the photoresist-coated substrate, a spin coater for applying the photoresist evenly, and an exposure system, such as a UV light source. Additionally, a developer system is necessary for developing the exposed photoresist, and a cleaning station is crucial for preparing substrates. Finally, inspection tools like optical microscopes or scanning electron microscopes are used to verify pattern quality.
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